another question about gdk_window_shape_combine_mask(...)
- From: "Xu, Jiang" <Jiang Xu echostar com>
- To:
- Cc: gtk-app-devel-list gnome org, gtk-list redhat com
- Subject: another question about gdk_window_shape_combine_mask(...)
- Date: Tue, 13 Feb 2001 11:47:55 -0700
I have a call back function which will be called when receive a expose event
or configure event.
In the call back function, according to different conditions it will draw
different transparent pixmaps that using gdk_window_shape_combine_mask to
shape the window, sometimes it will draw multi transparent pixmaps.
However, looks like it is very low efficient, because I see the screen
flushing multi-times and my callback function being called
several times.
So, is that a good way to solve this?? Or is there a way I could know when
my callback function being called is because of calling
gdk_window_shape_combine_mask???
Thanks
Jiang
> -----Original Message-----
> From: Havoc Pennington [SMTP:hp redhat com]
> Sent: Tuesday, February 13, 2001 12:35 PM
> To: Jiang XU
> Cc: gtk-app-devel-list gnome org; gtk-list redhat com
> Subject: Re: question about gdk_window_shape_combine_mask(...)
>
>
> Jiang XU <jiang xu echostar com> writes:
> >
> > How to use gdk_window_shape_combine_mask( GdkWindow *, GdkBitmap *
> > shape_mask, gint offset_x, gint offset_y )????
> >
> > What is "offset_x" and "offset_y" used for?? Is that to do with
> > "GdkBitmap *shape_mask"????
> >
>
> The position of the mask with respect to the window. i.e. where in the
> window is the mask located. Often 0,0 is correct.
>
> Havoc
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