another question about gdk_window_shape_combine_mask(...)



I have a call back function which will be called when receive a expose event
or configure event.
In the call back function, according to different conditions it will draw
different transparent pixmaps that using gdk_window_shape_combine_mask to
shape the window, sometimes it will draw multi transparent pixmaps.
However, looks like it is very low efficient, because I see the screen
flushing multi-times and my callback function being called
several times.
So, is that a good way to solve this??  Or is there a way I could know when
my callback function being called is because of calling
gdk_window_shape_combine_mask???

Thanks

Jiang

-----Original Message-----
From: Havoc Pennington [SMTP:hp redhat com]
Sent: Tuesday, February 13, 2001 12:35 PM
To:   Jiang XU
Cc:   gtk-app-devel-list gnome org; gtk-list redhat com
Subject:      Re: question about gdk_window_shape_combine_mask(...)


Jiang XU <jiang xu echostar com> writes:

How to use gdk_window_shape_combine_mask( GdkWindow *, GdkBitmap *
shape_mask, gint offset_x, gint offset_y )????

What is "offset_x" and "offset_y" used for??  Is that to do with
"GdkBitmap *shape_mask"????


The position of the mask with respect to the window. i.e. where in the
window is the mask located. Often 0,0 is correct.

Havoc




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